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Characterising material and process variation effects on springback robustness for a semi-cylindrical sheet metal forming process

journal contribution
posted on 2010-01-01, 00:00 authored by Timothy De Souza, Bernard RolfeBernard Rolfe
Variation in the incoming sheet material and fluctuations in the press setup is unavoidable in many stamping plants. The effect of these variations can have a large influence on the quality of the final stamping, in particular, unpredictable springback of the sheet when the tooling is removed. While stochastic simulation techniques have been developed to simulate this problem, there has been little research that connects the influence of the noise sources to springback. This paper characterises the effect of material and process variation on the robustness of springback for a semi-cylindrical channel forming operation, which shares a similar cross-section profile as many automotive structural components. The study was conducted using the specialised sheet metal forming package AutoFormTM Sigma, for which a series of stochastic simulations were performed with each of the noise sources incrementally introduced. The effective stress and effective strain scatter in a critical location of the part was examined and a response window, which indicates the respective process robustness, was defined. The incremental introduction of the noise sources allows the change in size of the stressstrain response window to be tracked. The results showed that changes to process variation parameters, such as BHP and friction coefficient, directly affect the strain component of the stressstrain response window by altering the magnitude of external work applied to forming system. Material variation, on the other hand, directly affected the stress component of the response window. A relationship between the effective stressstrain response window and the variation in springback was also established.

History

Journal

International journal of mechanical sciences

Volume

52

Issue

12

Pagination

1756 - 1766

Publisher

Elsevier

Location

Amsterdam, The Netherlands

ISSN

0020-7403

eISSN

1879-2162

Language

eng

Publication classification

C1 Refereed article in a scholarly journal

Copyright notice

2010, Elsevier